Method and apparatus for uniform polishing of a substrate

Details Method and apparatus for uniform polishing of a substrate Method and apparatus for uniform polishing of a substrate

1995-02-23

1996-09-24

Kisliuk, Bruce M.

Abrading

Abrading process

Glass or stone abrading

451278, 451285, 451287, 451288, 451398, 451527, B24B 100

Patent

active

055585639

ABSTRACT:
A method and apparatus for improved control of polishing in chemical-mechanical polishing operations is provided. The polishing is controlled by applying different amounts of pressure to the surface of a substrate during polishing. A polishing pad which includes raised portions is used to apply the varying amounts of pressure. In addition, the position, size and height of the raised portions is used to affect the amount of pressure applied.

REFERENCES:
patent: 5230184 (1993-07-01), Bukhman
patent: 5394655 (1995-03-01), Allen et al.
patent: 5435772 (1995-07-01), Yu

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