Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Reexamination Certificate
2005-01-04
2005-01-04
Silverman, Stanley S. (Department: 1754)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Halogenous component
C423S245300, C588S253000, C588S249000
Reexamination Certificate
active
06838065
ABSTRACT:
A method for treating waste gas containing PFC and/or HFC, comprising contacting a mixture of gas waste containing PFC and/or HFC, ozone, and water with an iron oxide catalyst at a temperature between 50 and 300° C. by gas-solid contact to perform an oxidation reaction for reducing the amount of PFC and/or HFC. An apparatus for treating waste gas containing PFC or HFC is also provided. The operational temperature in the present invention is much lower than the prior art, and thus provides lower energy consumption and little risk of fire. The present invention is suitable for the treatment of waste gas containing PFC and/or HFC, especially for the removal of perfluorocompounds from the waste gas generated by semiconductor and photoelectrical product manufacturing plants.
REFERENCES:
patent: 5145657 (1992-09-01), Kobayashi et al.
patent: 5609736 (1997-03-01), Yamamoto
patent: 6673326 (2004-01-01), Rossin et al.
Lin Bao-chang
Lin Shu-Sung
Wu Hsin-Hsien
Industrial Technology Research Institute
Johnson Edward M.
Silverman Stanley S.
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