Method and apparatus for treating substrates

Details Method and apparatus for treating substrates Method and apparatus for treating substrates

2005-02-22

2005-02-22

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

Work support

C118S050000, C118S052000, C118S054000, C118S728000, C118S729000, C118S733000, C156S345230, C156S345550

Reexamination Certificate

active

06858088

ABSTRACT:
To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a substrate surface that is to be coated is exposed, and the substrate is rotated together with the substrate holder, a cover can be secured to the substrate holder and together with the substrate holder forms a sealed chamber for the substrate.

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