Method and apparatus for treating gases

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423240, 423242, 55 71, 55 73, 261116, 239290, B01D 5334

Patent

active

040839320

ABSTRACT:
A novel spraying method and apparatus are disclosed for treating a gaseous stream in a gas-liquid contact zone. The apparatus includes a housing surrounding a spray nozzle which is provided with an opening for releasing the spray to a gaseous stream to be treated. The housing is pressurized with gaseous fluid, preferably air. The gaseous fluid leaves the housing through an opening surrounding the spray head or nozzle and forms a cylindrical gas curtain or shroud of gas around the housing opening in which the spray head is mounted. The gas shroud protects the spray nozzle by prohibiting the gas from the gaseous stream being treated from entering the housing and substantially reducing direct contact with the spray nozzle.

REFERENCES:
patent: 1234378 (1917-07-01), Parkin
patent: 1752031 (1930-03-01), Schaer
patent: 2373595 (1945-04-01), Peeps
patent: 2457304 (1948-12-01), Crowe
patent: 2478557 (1949-08-01), Pell et al.
patent: 2655986 (1953-10-01), Pennington
patent: 2708597 (1956-05-01), Wiitala et al.
patent: 2712961 (1955-07-01), Richardson
patent: 2747931 (1956-05-01), Wilson
patent: 2774639 (1956-12-01), Noon et al.
patent: 2970772 (1961-02-01), Boosinger et al.
patent: 3013731 (1961-12-01), Carlisle
patent: 3332623 (1967-07-01), Gallant
patent: 3814327 (1974-06-01), Dada
patent: 3880639 (1975-04-01), Bodner et al.
patent: 3995005 (1976-11-01), Teller

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for treating gases does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for treating gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for treating gases will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-989275

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.