Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Patent
1989-05-30
1990-10-16
Woodard, Joye L.
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Waste gas purifier
239105, 239290, 239296, 261116, 422159, 422224, 422310, B01D 5334, B05B 128
Patent
active
049633309
ABSTRACT:
According to the invention there is provided an arrangement which can be used in particular in a media-mixing nozzle assembly intended for use with or to be incorporated in a contact reactor. The nozzle assembly enables a first medium to be mixed with a second medium. This medium mixture is used to clean a contaminated medium fed to the contact reactor, by bringing the contaminated medium into contact with the medium mixture, this mixture containing an absorbent which is capable of reacting with the contaminants in the contaminated medium. The first medium and the second medium are supplied under overpressure to a mixing chamber provided in the nozzle assembly and located upstream of the exit orifice of a nozzle. Located adjacent the exit orifice is a device for creating a boundary layer in that part of the medium which is present around the jet of medium and located adjacent the jet of medium and adjacent the exit orifice, in a manner to completely or partially prevent-recycling of the jet of medium to the wall surface of the nozzle assembly.
REFERENCES:
patent: 1752031 (1930-03-01), Schaer
patent: 2613737 (1952-10-01), Schwietert
patent: 3885918 (1975-05-01), Isahaya
patent: 4083932 (1978-04-01), Muraco et al.
Jacobsson Per-Gunnar
Johansson Lars-Erik
Flakt AB
Woodard Joye L.
LandOfFree
Method and apparatus for treating contaminated gases does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for treating contaminated gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for treating contaminated gases will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-848616