Method and apparatus for treating a waste gas containing...

Details Method and apparatus for treating a waste gas containing... Method and apparatus for treating a waste gas containing...

2005-09-27

2005-09-27

Tran, Hien (Department: 1764)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Waste gas purifier

C422S171000, C422S177000

Reexamination Certificate

active

06949225

ABSTRACT:
An apparatus for treatment of a waste gas, containing fluorine-containing compounds, comprises: a solids treating device for separating solids from the waste gas; an addition device for adding H2and/or H2O, or H2and/or H2O and O2, as a decomposition assist gas to the waste gas leaving the solids treating device; a thermal decomposition device that is packed with γ-alumina heated at 600–900° C., and which thermally decomposes the waste gas to which the decomposition assist gas has been added; an acidic gas treating device for removing acidic gases from the thermally decomposed waste gas; and channels or lines for connecting these devices in sequence. The apparatus preferably includes an air ejector which is capable of adjusting an internal pressure of the apparatus.

REFERENCES:
patent: 5649985 (1997-07-01), Imamura
patent: 5955037 (1999-09-01), Holst et al.
patent: 6126906 (2000-10-01), Imamura
patent: 2001/0001652 (2001-05-01), Kanno et al.
patent: 43-19-118 (1994-12-01), None
patent: 0-885-648 (1998-12-01), None
patent: 0-916-388 (1999-05-01), None
patent: 10-286434 (1998-10-01), None
patent: 00/09258 (2000-02-01), None
Dr. Hiroshi Shimizu, “Handbook of Adsorption Technique”, Feb. 2, 1993, pp. 792-795.

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