Method and apparatus for transfer of a reticle pattern onto a su

Details Method and apparatus for transfer of a reticle pattern onto a su Method and apparatus for transfer of a reticle pattern onto a su

1991-11-04

1994-03-29

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 71, 355 30, G03B 2742

Patent

active

052989399

ABSTRACT:
A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection lens. A loading system, wafer adjustment system, and focusing system are also disclosed.

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Telefax Message dated Jun. 15, 1990 from Dr. R. Wijnaendts to Mr. Bill Tobey ACT; Telefax Message dated Jun. 13, 1990 from Dr. Wijnaendts to Mr. A. C. Tobey; Patent Specification, including 4 sheets of drawing, for application entitled, "Process for Producing or Inspecting Micropatterns on Large-area Substrates".

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