Method and apparatus for the production of reaction mixtures fro

Details Method and apparatus for the production of reaction mixtures fro Method and apparatus for the production of reaction mixtures fro

1976-09-13

1977-09-27

Serwin, R.E.

Chemistry: physical processes

Physical processes

Crystallization

23253A, 73195, G01F 186, G01F 188, G01N 926

Patent

active

040508960

ABSTRACT:
The instant invention is directed to a method and apparatus for measuring the proportion of undissolved gas in a liquid component for the production of foam materials, particularly, those based on polyurethane. The method is based on the equation of state of ideal gases (Boyle-Mariot Law: P .sup.. V = constant) at constant temperatures. The gas contained in a liquid component charged with gas increases its volume under expansion according to the above equation. The gas expansion causes expansion of the liquid gas mixture. The difference in the volumetric flow rate of the liquid, at two differing pressures, is therefore a measurement of the quantity of gas present in the liquid. The apparatus consists of one volumetric flow rate measurement unit connected upstream of a pressure drop unit, a second volumetric flow rate measurement unit connected downstream of the pressure drop unit and a differential value indicator connected to the first and second volumetric flow rate measurement units.

REFERENCES:
patent: 2538824 (1951-01-01), Andresen, Jr.
patent: 3062271 (1962-11-01), Rijnsdorp
patent: 4009614 (1977-03-01), Sheppard et al.

Affiliated with

Also associated with

Rating

Method and apparatus for the production of reaction mixtures fro does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for the production of reaction mixtures fro, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for the production of reaction mixtures fro will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1812520