Method and apparatus for the production of a semiconductor...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

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C438S022000, C438S034000, C438S044000

Reexamination Certificate

active

06869806

ABSTRACT:
Films of gallium manganese nitride are grown on a substrate by molecular beam epitaxy using solid source gallium and manganese and a nitrogen plasma. Hydrogen added to the plasma provides improved uniformity to the film which may be useful in spin-based electronics.

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USPTO Office Action dated Nov. 12, 2004.

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