Method and apparatus for the preparation of clean gases

Details Method and apparatus for the preparation of clean gases Method and apparatus for the preparation of clean gases

2006-04-18

2006-04-18

Spitzer, Robert H. (Department: 1724)

Gas separation: processes

Solid sorption

Inorganic gas or liquid particle sorbed

C095S052000, C095S143000, C095S237000, C096S057000, C096S074000, C096S134000, C096S135000, C096S153000, C055S385200, C055S482100, C055S485000

Reexamination Certificate

active

07029518

ABSTRACT:
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.

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