Method and apparatus for the preparation of clean gases

Details Method and apparatus for the preparation of clean gases Method and apparatus for the preparation of clean gases

2005-06-28

2005-06-28

Spitzer, Robert H. (Department: 1724)

Gas separation: processes

Compressing and indirect cooling of gaseous fluid mixture to...

C095S052000, C095S063000, C095S118000, C095S129000, C095S137000, C095S143000, C095S287000, C096S004000, C096S052000, C096S055000, C096S134000, C055S385200

Reexamination Certificate

active

06911064

ABSTRACT:
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.

REFERENCES:
patent: 4000990 (1977-01-01), Bingham
patent: 4153429 (1979-05-01), Matthews et al.
patent: 4629479 (1986-12-01), Cantoni
patent: 4655049 (1987-04-01), Andrews et al.
patent: 4741882 (1988-05-01), Weichselgartner
patent: 4881953 (1989-11-01), Prasad et al.
patent: 5034125 (1991-07-01), Karbachsch et al.
patent: 5039321 (1991-08-01), Satoh et al.
patent: 5042997 (1991-08-01), Rhodes
patent: 5069692 (1991-12-01), Grennan et al.
patent: 5080699 (1992-01-01), Ho et al.
patent: 5221520 (1993-06-01), Cornwell
patent: 5296018 (1994-03-01), Suzuki
patent: 5399319 (1995-03-01), Schoenberger et al.
patent: 5451249 (1995-09-01), Spiegel et al.
patent: 5470379 (1995-11-01), Garrett
patent: 5676736 (1997-10-01), Crozel
patent: 5743940 (1998-04-01), Sugo et al.
patent: 5922105 (1999-07-01), Fujii et al.
patent: 6340381 (2002-01-01), Fujii et al.
patent: 3703137 (1988-08-01), None
patent: 62-132523 (1987-06-01), None
patent: 2-57844 (1990-02-01), None
patent: 2-126912 (1990-05-01), None
patent: 5-67325 (1993-09-01), None
Iwasaki, Nobuo and Takahashi, Kazuhiro, “Performance test of adsorbers to trap harmful gases to silicone wafer”, 9thAnnual Meeting on Air Cleaning and Contamination Control, May 8-9, 1990, pp. 249-250 (with English summary).
Kajima, Tomoaki, Suzuki, Yoshinobu and Ohkita, Masanobu, Contamination of Wafer by Gases and Chemical Ions and its Control Method; Analysis;“Analysis an Removal of Adsorptive Organic Gases on Wafer”, 11thAnnual Meeting on Air Cleaning and Contamination Control, Apr. 21-22, 1992, pp. 223-226 (with English summary).
Kuki Seijo (Air Cleaning), “Studies on Removal of Cigarette Smoke as an indoor Air Contaminant,” vol. 25, No. 2, Aug. 1, 1987 (with English summary).

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