Method and apparatus for the preparation of clean gases

Gas separation: processes – Electric or electrostatic field – And nonelectrical separation of fluid mixture

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

95118, 95129, 95137, 95143, 95287, 96 52, 96 55, 96134, 553852, B01D 5304

Patent

active

059221054

ABSTRACT:
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.

REFERENCES:
patent: 4000990 (1977-01-01), Bingham
patent: 4007875 (1977-02-01), Stolz et al.
patent: 4153429 (1979-05-01), Matthews et al.
patent: 4451435 (1984-05-01), Holter et al.
patent: 4629479 (1986-12-01), Cantoni
patent: 4655049 (1987-04-01), Andrews et al.
patent: 4746338 (1988-05-01), Williams
patent: 5030423 (1991-07-01), Obee et al.
patent: 5039321 (1991-08-01), Satoh et al.
patent: 5042997 (1991-08-01), Rhodes
patent: 5047348 (1991-09-01), Stinson
patent: 5080699 (1992-01-01), Ho et al.
patent: 5122170 (1992-06-01), Satoh et al.
patent: 5221520 (1993-06-01), Cornwell
patent: 5228888 (1993-07-01), Gmelin et al.
patent: 5296018 (1994-03-01), Suzuki
patent: 5399319 (1995-03-01), Schoenberger et al.
patent: 5451249 (1995-09-01), Spiegel et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for the preparation of clean gases does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for the preparation of clean gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for the preparation of clean gases will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2272308

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.