Method and apparatus for the partial coating of a substrate by c

Details Method and apparatus for the partial coating of a substrate by c Method and apparatus for the partial coating of a substrate by c

1981-01-08

1982-10-19

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

043549101

ABSTRACT:
An apparatus for coating substrates by cathode sputtering, containing a cathode and anode in a chamber, gas admixture and gas discharge means and a system for producing a vacuum in said chamber, at least one substrate being insulatingly installed in the cathode so that the part of the substrate to be coated extends beyond the cathode surface into the region of the plasma of the glow discharge. The method of coating is performed advantageously by means of a glow discharge in the anomalous cathode fall in a pressure range of from about 0.1-5 Torr at about 300 to 1000 V.

REFERENCES:
patent: 4126530 (1978-11-01), Thornton

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