X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1984-02-27
1987-03-10
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 73, G01N 2320
Patent
active
046495568
ABSTRACT:
A method and apparatus for the "on-line", nondestructive measurement and control of grain size in various materials, such as steel, powders, ceramics, semiconductors, and crystalline polymers. A substantially monochromatic beam of X-rays is directed at the material as it moves relative to a predetermined measuring station. The incident X-ray beam has a predetermined cross-sectional area so that over a plurality of time intervals a plurality of corresponding non-overlapping area segments are irradiated. The time-integrated intensity of diffracted radiation from each non-overlapping area segment is measured and the relative variance of the intensity measurements within the total area irradiated is determined. The relative variance of the measured intensities is then used to determine the grain size of the products which is generally reported as the mean grain diameter, weighted with respect to volume.
REFERENCES:
patent: 2958777 (1960-11-01), Sieswerda
patent: 3144556 (1964-08-01), van Tillo
patent: 3564251 (1971-02-01), Youmans
patent: 4076981 (1978-02-01), Sparks
"X-Ray Diffraction Procedures", Klug et al., John Wiley and Sons Inc., New York, 1954, p. 88.
Cohen Jerome B.
Hilliard John E.
Rinik Christine
Church Craig E.
Northwestern University
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