Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having growth from a solution comprising a solvent which is...
Reexamination Certificate
2007-10-23
2007-10-23
Hiteshew, Felisa (Department: 1722)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having growth from a solution comprising a solvent which is...
C117S201000, C117S202000, C117S902000
Reexamination Certificate
active
11003578
ABSTRACT:
For the measurement, orientation and fixation of at least one single crystal, it is the object of the invention to ensure increased accuracy in the determination of crystallographic orientation and oriented fixation regardless of the outer geometry of the single crystals, and the fixation should guarantee a highly accurate cutting also with very hard materials such as sapphire or silicon carbide. The single crystal is adjustably positioned on a revolving table for determining the crystal lattice orientation, wherein the crystal lattice orientation is determined during at least one revolution of the revolving table based on a plurality of x-ray reflections. The orientation of the crystal lattice is carried out with reference to the determined angles of the normal of the lattice plane relative to the axis (X-X) of the revolving table as reference direction before carrying out the fixation of the single crystal and the fastening on a support oriented in reference direction. By virtue of the invention, a plurality of single crystals can be oriented, fixated, stacked one on top of the other and connected to one another and subsequently connected simultaneously to a common support. Further, the invention makes it possible to monitor the orientation of every single crystal after fastening to the common support.
REFERENCES:
patent: 3870880 (1975-03-01), Merigoux et al.
patent: 4412345 (1983-10-01), Workman et al.
patent: 4771446 (1988-09-01), Howe et al.
patent: 4788702 (1988-11-01), Howe et al.
patent: 5839424 (1998-11-01), Hauser
patent: 5904136 (1999-05-01), Nagatsuka et al.
patent: 697 21 115 (1997-03-01), None
patent: 197 23 083 (1997-06-01), None
patent: 0 245 923 (1987-03-01), None
patent: 0 802 029 (1997-10-01), None
patent: 57136150 (1982-08-01), None
patent: WO 00/06999 (2000-02-01), None
Patent Abstracts of Japan; Publication No. 09-033456 published Feb. 7, 1997 (Appln No. 07-207372 Jul. 24, 1995, Rigaku Corp.).
Berger Hans
Bradaczek Hans
Schwabe Hartmut
EFG Elektrotechnische Fabrikations-und Grosshandelsgesellschaft
Hiteshew Felisa
Reed Smith LLP
LandOfFree
Method and apparatus for the measurement, orientation and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for the measurement, orientation and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for the measurement, orientation and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3877829