Method and apparatus for the initiation of chemical reactions

Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204158R, 204162R, 204DIG11, 250527, B01J 110, B01K 100

Patent

active

040123014

ABSTRACT:
Laser radiation is employed to initiate and promote chemical reactions by creating states of molecular vibrational mode excitation exceeding those appropriate to the translational temperature of the medium in one or more of the reactants. In favorable cases, vibrational excitation in a certain vibrational normal mode of a reactant will act to accelerate the rate of a desired chemical reaction. The reactants can be pressurized so that their vibration-rotation spectrum can be broadened to the point that laser radiation can be absorbed without the need for exact coincidence between a line or lines of the spectrum of the reactant and that of available lasers. Provision can be made for isolation and analysis of products, recycling of unused reactants, temperature control of reactants and real-time monitoring of the state of vibrational excitation of the reactants.

REFERENCES:
mayer et al., Applied Optics, vol. 17, No. 12 (Dec. 15, 1970) pp. 516-519.
Ambartzumian et al., Applied Optics, vol. 11, No. 2 (Feb. 1972) pp. 354-358.
Karlov, Applied Optics, vol. 13, No. 2 (Feb. 1974), pp. 301-309.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for the initiation of chemical reactions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for the initiation of chemical reactions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for the initiation of chemical reactions will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-424241

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.