Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1982-03-12
1983-10-11
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204 13, 204200, 204201, 204275, 204277, 204278, C25D 1700
Patent
active
044090820
ABSTRACT:
Apparatus for the electrolytic deposition of metal onto metallic or appropriately pre-treated non-metallic objects and cleaning these objects of adhering surface treatment agents after further treatment as well as recovery of these treatment agents, with treatment station, drum installation, anodes, work container, supply bin, rotating arrangement, dosing and measuring arrangements, electrical attachments as well as connected conduit tubes, thereby characterized in that in the work container with overflow arrangement, two anodes are semicircularly arranged around the drum aggregate, whereby the work container is connected across an opening with fractionating arrangement, to a supply container with vacuum space for the surface treatment agent, which can be adjusted to a reduced pressure by means of a vacuum arrangement, and whereby the supply container is connected across a recirculation conduit to the work container, as well as a method using this apparatus. With current density up to 20.0 A/dm.sup.2, layer thickness from 25 to 30 .mu.m can be obtained, with quantitative recovery of the electrolyte in a closed circulation.
REFERENCES:
patent: 1429170 (1922-09-01), Severance
patent: 1618199 (1927-02-01), Hulmer
patent: 3607712 (1971-09-01), Barton
patent: 4129494 (1978-12-01), Norman
patent: 4151062 (1979-04-01), Norris
patent: 4153531 (1979-05-01), Faul et al.
patent: 4337135 (1982-06-01), Quinton et al.
Demers Arthur P.
Schering AG
Striker Michael J.
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