Method and apparatus for the fixation of radioactive krypton

Details Method and apparatus for the fixation of radioactive krypton Method and apparatus for the fixation of radioactive krypton

1984-06-21

1986-04-01

Metz, Andrew H.

Chemistry: electrical and wave energy

Processes and products

204 381, 204192C, 204192SP, C25D 548, C23C 1500

Patent

active

045796351

ABSTRACT:
A method for disposing of radioactive krypton by embedding it with radioactive palladium or molybdenum on the inner surface of a steel cylindrical container. The embedding is effected by sputtering from a glow discharge krypton plasma disposed in the annular space between a sputtering electrode arranged concentrically with the side wall of said cylindrical container which serves as the embedding electrode. The sputtering electrode is coated with radioactive palladium, molybdenum, or other metal, by electrolytically depositing said metal from a radioactive fission solution. After sputtering, the container is sealed and put in final storage. The method disposes of the radioactive metal deposited on the sputtering electrode as well as the krypton.

REFERENCES:
patent: 3486935 (1969-12-01), Eyrich
patent: 4051063 (1977-09-01), Nelson et al.
patent: 4094762 (1978-06-01), Clelland
M. A. Bayne et al., Krypton Entrapment in Pulse-Biased Sputter-Deposited Metals, Thin Solid Films, 54 (1978), pp. 327-336.

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