Method and apparatus for the exposing of light-sensitive materia

Details Method and apparatus for the exposing of light-sensitive materia Method and apparatus for the exposing of light-sensitive materia

1993-05-21

1996-01-30

Reinhart, Mark J.

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

347134, B41J 247

Patent

active

054884063

ABSTRACT:
A method for the exposure of photo-sensitive material to be exposed (1) is performed inside of a casing (2) sealed against light from an external light source. The material to be exposed (1) is placed in a circular arc-shaped plane (3) having a uniform distance to a center longitudinal axis (4). Laser light beams (10), derived from the laser beam (6) of a laser generator (5) and deflected with a rotatable mirror (9), are providing exposure spots on the material to be exposed (1) with point-shaped signals. The recording speed is doubled or, respectively, an image or text composition is processed in half the time previously required by deflecting the light beams (10), exiting in parallel to an axis from the collimator (8), onto at least two mirror faces (12a and 12b), disposed at an angle (11) relative to the center median axis (4). Thereupon, the reflected parallel light beams (20) are focused in an optical system (13) and the light beams (15, 16) are then directed radially onto the focusing plane (14) of the rotary and circulating surface (1a) of the material to be exposed (1).

REFERENCES:
patent: 1857130 (1932-05-01), Alexanderson
patent: 3475553 (1969-10-01), Reese et al.
patent: 3656828 (1972-04-01), Scholdstrom
patent: 4260997 (1981-04-01), Fukui
patent: 4684228 (1987-08-01), Holthusen
patent: 5114217 (1992-05-01), Beiser
Publication: "Quantum Electronics" by Amnon Yariv, publishers John Wiley and Sons. Inc. New York 1967, chapter 19, pp. 310 through 327.

Affiliated with

Also associated with

Rating

Method and apparatus for the exposing of light-sensitive materia does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for the exposing of light-sensitive materia, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for the exposing of light-sensitive materia will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-159159