Method and apparatus for the electrochemical deposition and...

Chemistry: electrical and wave energy – Apparatus – Electrolytic

Reexamination Certificate

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C204S22400M, C204S279000, C204S284000, C204S288100

Reexamination Certificate

active

10921666

ABSTRACT:
An electrochemical apparatus is provided which deposits material onto or removes material from the surface of a workpiece. The apparatus comprises a polishing pad and a platen which is in turn comprised of a first conductive layer in contact with the polishing pad and coupled to a first potential, a second conductive layer coupled to a second potential, and a first insulating layer disposed between the first and second conductive layers. At least one electrical contact is positioned within the polishing pad and is electrically coupled to the second conductive layer. A reservoir is provided which places an electrolyte solution in contact with the polishing pad and the workpiece. A carrier positions and/or presses the workpiece against the polishing pad.

REFERENCES:
patent: 6802955 (2004-10-01), Emesh et al.
patent: 7025860 (2006-04-01), Chadda
patent: 7201828 (2007-04-01), Emesh
patent: 2001/0035354 (2001-11-01), Ashjaee et al.
patent: 2003/0132120 (2003-07-01), Emesh et al.
patent: 2004/0163950 (2004-08-01), Emesh
patent: 2004/0211662 (2004-10-01), Chadda
patent: 2005/0016681 (2005-01-01), Emesh et al.

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