Method and apparatus for the controlled formation of...

Etching a substrate: processes – Nongaseous phase etching of substrate

Reexamination Certificate

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C216S052000, C216S056000

Reexamination Certificate

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11175878

ABSTRACT:
The present invention discloses a method and apparatus for the directed formation of a re-entrant micro-jet formed upon the collapse of a working cavitation bubble formed proximate to a work surface. A target bubble, formed between the work surface and the working cavitation bubble, is utilized to direct the re-entrant micro-jet to the work surface.

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