Drying and gas or vapor contact with solids – Apparatus – For diverse operations on treated material
Reexamination Certificate
2006-12-12
2006-12-12
Rinehart, Kenneth (Department: 3749)
Drying and gas or vapor contact with solids
Apparatus
For diverse operations on treated material
C034S426000, C034S443000
Reexamination Certificate
active
07146744
ABSTRACT:
The present invention provides method and apparatus for surface treatment which, when employed in process steps of manufacturing semiconductor devices, can result in the final products having enhanced reliability. According to the surface processing method, an obeject to be processed W is introduced in a processing vessel10, which is then supplied with ClF3gas serving as cleaning gas from a supply unit26. The ClF3gas is bound to the surface of the object to be processed W, and although the supply of the gas to the processing vessel is interrupted, the ClF3gas bound to the surface of the object to be processed W serves to clean the surface of the object to be processed. Next, reducing gas is introduced into the processing vessel W to remove chlorine from the object to be processed W, the chlorine being derived from the ClF3gas. After that, the introduction of the reducing gas is interrupted, and the cleaned object to be processed W is exported from the processing vessel10. In addition to that, a surface processing apparatus1and other processing devices are arranged in a cluster device so that an object to be processed therein is transported among them from one to another under a vacuum environment.
REFERENCES:
patent: 4816638 (1989-03-01), Ukai et al.
patent: 5342471 (1994-08-01), Fukasawa et al.
patent: 5350480 (1994-09-01), Gray
patent: 5395474 (1995-03-01), Suzuki et al.
patent: 5478429 (1995-12-01), Komino et al.
patent: 5614055 (1997-03-01), Fairbairn et al.
patent: 5772832 (1998-06-01), Collins et al.
patent: 5851600 (1998-12-01), Horiike et al.
patent: 5861601 (1999-01-01), Sato et al.
patent: 5961850 (1999-10-01), Satou et al.
patent: 5976308 (1999-11-01), Fairbairn et al.
patent: 5989345 (1999-11-01), Hatano
patent: 6036782 (2000-03-01), Tanaka et al.
patent: 6059922 (2000-05-01), Yamazaki et al.
patent: 1-200628 (1989-08-01), None
patent: 3-243688 (1991-10-01), None
patent: 4-181734 (1992-06-01), None
patent: 4-206526 (1992-07-01), None
patent: 6-196455 (1994-07-01), None
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Rinehart Kenneth
Tokyo Electron Limited
LandOfFree
Method and apparatus for surface treatment does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for surface treatment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for surface treatment will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3690915