Method and apparatus for surface potential reflection...

Details Method and apparatus for surface potential reflection... Method and apparatus for surface potential reflection...

2002-03-26

2008-10-07

Font, Frank G (Department: 2883)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

Reexamination Certificate

active

07432514

ABSTRACT:
A method (and structure) for controlling a beam used to generate a pattern on a target surface includes generating a beam of charged particles and directing the beam to a mask surface and causing the beam to be either absorbed by or reflected from the mask surface, thereby either precluding or allowing the beam to strike the target surface, based on a reflection characteristic of the mask surface.

REFERENCES:
patent: 5254417 (1993-10-01), Wada
patent: 5319207 (1994-06-01), Rose et al.
patent: 5393623 (1995-02-01), Kamon
patent: 6277542 (2001-08-01), Okino et al.
patent: 6610980 (2003-08-01), Veneklasen et al.
patent: 6803571 (2004-10-01), Mankos et al.
patent: 6870172 (2005-03-01), Mankos et al.
patent: 2001/0038953 (2001-11-01), Tsukamoto et al.

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