Fluid sprinkling – spraying – and diffusing – Processes
Reexamination Certificate
2007-01-24
2011-11-29
Ganey, Steven J (Department: 3752)
Fluid sprinkling, spraying, and diffusing
Processes
C239S104000, C239S106000, C239S120000, C239S548000, C239S566000, C239S597000, C239S601000, C029S890142, C029S890143
Reexamination Certificate
active
08066201
ABSTRACT:
Apparatus for supplying a fluid comprising a pipe having at least one aperture through a wall of the pipe, each of the at least one apertures comprising a first portion in an inner surface of the wall, a second portion in an outer surface of the wall, the first portion intersecting the second portion to form an opening, the first portion having a first cross-sectional area at the inner surface that is greater than a second cross-sectional area of the opening; wherein the first cross-sectional area and the second cross-sectional area have a first ratio within a first predetermined range so as to enable fluid flowing through the pipe at a predetermined flow rate to exert a predetermined pressure to spray fluid from the at least one aperture to atmosphere and also to flush the first portion.
REFERENCES:
patent: 2665946 (1954-01-01), Broughton
patent: 3447756 (1969-06-01), Lawrence, Jr.
patent: 3584786 (1971-06-01), Johnson
patent: 3647147 (1972-03-01), Cook
patent: 4161873 (1979-07-01), Mabery
patent: 4435891 (1984-03-01), Nicholson
patent: 6065321 (2000-05-01), Kosch et al.
patent: 2424989 (2002-05-01), None
patent: 169764 (1986-01-01), None
patent: 2093372 (1982-09-01), None
patent: 889117 (1981-12-01), None
Browning & Bushman P.C.
Ganey Steven J
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