Measuring and testing – Liquid level or depth gauge
Patent
1990-08-22
1991-09-17
Cuchlinski, Jr., William A.
Measuring and testing
Liquid level or depth gauge
73298, 116206, 116227, 340620, 436 40, G01F 2322
Patent
active
050483340
ABSTRACT:
A method and an apparatus for determining the thickness of a layer of a first liquid above an interface formed by the first liquid and the second liquid underlying the first liquid in a subterranean formation. The apparatus includes an elongated metal rod having a sharpened distal end. An electrode is provided adjacent the sharpened distal end to indicate when the interface formed by the two liquids has been reached. A lengthwise running elongated slot is provided in the outer surface of the body of the metal rod and contains an indicator strip. The indicator strip is adapted to undergo a color change upon contact with the first liquid. By measuring the length of the indicator strip which has undergone a color change, the thickness of the layer of the first liquid can be determined.
REFERENCES:
patent: 3745659 (1973-07-01), Hsu
patent: 3963442 (1976-06-01), Bullard et al.
patent: 4287472 (1981-09-01), Pan et al.
patent: 4345466 (1982-08-01), Lesser
patent: 4407159 (1983-10-01), Wytaniec
patent: 4663614 (1987-05-01), Rauchwerger
patent: 4728941 (1988-03-01), Andrejasich
patent: 4771006 (1988-09-01), Miller et al.
patent: 4827246 (1989-05-01), Dolan et al.
patent: 4845978 (1989-07-01), Whitford
Hampton Duane R.
Howell James
Wagner Ross
Bennett G. Bradley
Cuchlinski Jr. William A.
The Board of Trustees of Western Michigan University
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