Method and apparatus for storing wafers without moisture absorpt

Details Method and apparatus for storing wafers without moisture absorpt Method and apparatus for storing wafers without moisture absorpt

1998-04-30

2000-03-07

Recla, Henry J.

Fluent material handling, with receiver or receiver coacting mea

Combined

141 48, 141 63, 141 67, 141 94, 141 95, 141 4, 141 11, 414935, B65B 104

Patent

active

060327049

ABSTRACT:
A method and apparatus for storing wafers without the moisture absorption problem by providing a wafer storage container that has a cavity therein and an inert gas supply line into the cavity for flowing an inert gas at a substantially constant flow rate into the cavity while allowing a portion of the inert gas to escape into surrounding environment outside the cavity such that there is always a positive pressure differential maintained between the cavity and the outside environment to keep out moisture.

REFERENCES:
patent: 5378283 (1995-01-01), Ushikawa
patent: 5806574 (1998-09-01), Yamashita et al.
patent: 5846338 (1998-12-01), Bonora et al.
patent: 5879458 (1999-03-01), Roberson, Jr. et al.

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