Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-08-07
2007-08-07
Nguyen, Sang H. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S606000, C356S602000, C250S216000, C250S548000
Reexamination Certificate
active
10753391
ABSTRACT:
Apparatus for sensing information regarding a surface including a first plurality of optical elements arranged to acquire two dimensional information about a surface, a second plurality of optical elements arranged to acquire topographical information about the surface, wherein the first plurality and the second plurality of optical elements are arranged to simultaneously provide the two dimensional information and the topographical information to at least partially non-overlapping portions of a single sensor array.
REFERENCES:
patent: 4741621 (1988-05-01), Taft et al.
patent: 4845373 (1989-07-01), Jamieson et al.
patent: 5058178 (1991-10-01), Ray
patent: 5127061 (1992-06-01), Amir et al.
patent: 5166985 (1992-11-01), Takagi et al.
patent: 5189481 (1993-02-01), Jann et al.
patent: 5293324 (1994-03-01), Tokura
patent: 5638175 (1997-06-01), Brunfeld et al.
patent: 5761337 (1998-06-01), Nishimura et al.
patent: 5774572 (1998-06-01), Caspi
patent: 5798829 (1998-08-01), Vaez-Iravani
patent: 6437312 (2002-08-01), Adler et al.
patent: 6496254 (2002-12-01), Bostrom et al.
patent: 6521866 (2003-02-01), Arai et al.
patent: 6552783 (2003-04-01), Schmidt et al.
patent: 6587600 (2003-07-01), Shipley
patent: 6621581 (2003-09-01), Hunt et al.
patent: 6654115 (2003-11-01), Zemer et al.
patent: 6806971 (2004-10-01), Finarov
patent: 6954274 (2005-10-01), Sasaki et al.
patent: 7078650 (2006-07-01), Gross et al.
patent: 2001/0012107 (2001-08-01), Toh
patent: 2003/0006364 (2003-01-01), Katzir et al.
patent: WO 01/50760 (2001-07-01), None
Brunfeld Andrei
Lutsker Ilia
Toker Gregory
Nguyen Sang H.
Orbotech Ltd.
Sughrue & Mion, PLLC
LandOfFree
Method and apparatus for simultaneous 2-D and topographical... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for simultaneous 2-D and topographical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for simultaneous 2-D and topographical... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3882764