Method and apparatus for separating sample

Details Method and apparatus for separating sample Method and apparatus for separating sample

2006-03-28

2006-03-28

Hwu, Davis (Department: 3752)

Fluid sprinkling, spraying, and diffusing

With means for fluctuating flow or pressure of fluid...

C239S093000, C239S095000, C239S140000, C239S099000

Reexamination Certificate

active

07017830

ABSTRACT:
This invention is to improve the reproducibility and yield in separating a bonded substrate stack. A bonded substrate stack having a porous layer inside is held by substrate holding portions105and106,and a fluid is injected from a nozzle to the porous layer of the bonded substrate stack, thereby separating the bonded substrate stack at the porous layer. The variation in pressure of the fluid is suppressed within a predetermined range by a servo-driven pump.

REFERENCES:
patent: 3994809 (1976-11-01), Rhodes
patent: 5360748 (1994-11-01), Nadahara et al.
patent: 5371037 (1994-12-01), Yonehara
patent: 5458755 (1995-10-01), Fujiyama et al.
patent: 5811348 (1998-09-01), Matsushita et al.
patent: 5856229 (1999-01-01), Sakuguchi et al.
patent: 5863830 (1999-01-01), Bruel et al.
patent: 6107213 (2000-08-01), Tayanaka
patent: 6186193 (2001-02-01), Phallen et al.
patent: 6313014 (2001-11-01), Sakaguchi et al.
patent: 6350703 (2002-02-01), Sakaguchi et al.
patent: 6382292 (2002-05-01), Ohmi et al.
patent: 6391743 (2002-05-01), Iwane et al.
patent: 6418999 (2002-07-01), Yanagita et al.
patent: 6427747 (2002-08-01), Omi et al.
patent: 6427748 (2002-08-01), Yanagita et al.
patent: 6436226 (2002-08-01), Omi et al.
patent: 6448155 (2002-09-01), Iwasaki et al.
patent: 6468923 (2002-10-01), Yonehara et al.
patent: 6475460 (2002-11-01), Max
patent: 6497794 (2002-12-01), Max
patent: 2001/0038153 (2001-11-01), Sakaguchi et al.
patent: 2002/0045237 (2002-04-01), Yanagita et al.
patent: 0 867 917 (1998-09-01), None
patent: 5-21338 (1993-01-01), None
patent: 7-302889 (1995-11-01), None
patent: 11-005064 (1999-01-01), None
patent: 11-45840 (1999-02-01), None
patent: WO 98/52216 (1998-11-01), None
R.P. Holmstrom et al., “Complete dielectric isolation by highly selective and self-stopping formation of oxidized porous silicon”, Appl. Phys. Lett 42(4), pp. 386-388, Feb. 15, 1983.
A. Uhlir, Jr., “Electrolytic Shaping of Germanium and Silicon”, The Bell System Technical Journal, vol. XXXV 1956, pp. 333-347.
K. Nagano et al., “Oxidized Porous Silicon and It's Application”, IEICE, vol. 79, pp. 49-54, SSD79-9549, 1979.
T. Unagami, “Formation Mechanism of Porous Silicon Layer by Anodization in HF Solution”, Journal of the Electrochemical Society, vol. 127, No. 2, pp. 476-483, Feb. 1980.

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