Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2007-09-18
2007-09-18
Lee, Michael G. (Department: 2876)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
10775718
ABSTRACT:
A wafer stage overlay error map is created using standard overlay targets and a special numerical algorithm. A reticle including a 2-dimensional array of standard overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic exposure tool. After exposure, the overlay targets are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is then supplied to a software program that generates a 2-dimensional wafer stage distortion and yaw overlay error map.
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Hunter, Jr. Robert
McArthur Bruce
Smith Adlai
Koyama Kumiko C.
Lee Michael G.
Litel Instruments
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