Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2006-08-29
2006-08-29
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C356S124000, C430S022000, C355S053000, C355S077000
Reexamination Certificate
active
07099011
ABSTRACT:
A projection lens distortion error map is created using overlay targets and a special numerical algorithm. A reticle including an array of overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic stepper. After exposure, the overlay targets are measured for placement error. The resulting overlay error data is then supplied to a software program that generates a lens distortion error map for the photolithographic projection system.
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Hunter, Jr. Robert
McArthur Bruce
Smith Adlai
Litel Instruments
Pham Hoa Q.
Stock, Jr. Gordon J.
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