Method and apparatus for self-referenced dynamic step and...

Photocopying – Projection printing and copying cameras – Distortion introducing or rectifying

Reexamination Certificate

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C355S053000

Reexamination Certificate

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06906780

ABSTRACT:
A reticle consisting of a 2-dimensional array of standard overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic scanner. Next, the overlay targets are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is then fed into a software program that generates the lens contribution to the intra-field error map for the photolithographic projection scanning system.

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