Method and apparatus for sampling a plasma into a vacuum chamber

Details Method and apparatus for sampling a plasma into a vacuum chamber Method and apparatus for sampling a plasma into a vacuum chamber

1983-01-14

1985-02-26

Smith, Alfred E.

Radiant energy

Ionic separation or analysis

With sample supply means

250281, 250282, 250423R, H01J 4904, H01J 4926

Patent

active

045019657

ABSTRACT:
A plasma is generated within an induction coil and the plasma is sampled through an orifice into a vacuum chamber for mass analysis of trace ions in the plasma. Arcing at the orifice is prevented by grounding the induction coil at or near its center, thus eliminating ultraviolet noise and reducing average ion energies and ion energy spread, as well as preventing destruction of the orifice. The elimination of arcing at the orifice allows the use of a sharp edge orifice structure to prevent formation of a cool boundary layer over the orifice and also permits direct sampling of the plasma. The direct sampling and the lack of cooling prevent recombination and reaction of the ions with oxygen and improve the response to elements of high ionization potential, increasing the desired ion signal and greatly reducing the presence of oxides which would otherwise complicate the spectrum.

REFERENCES:
patent: 3085058 (1963-04-01), Buchsbaum
patent: 3143680 (1964-08-01), Klein et al.
patent: 3944826 (1976-03-01), Gray

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