Boots – shoes – and leggings
Patent
1997-01-28
1998-12-08
Gordon, Paul P.
Boots, shoes, and leggings
2504922, 25049222, 430313, 430296, 430942, G06F 1100, G03C 500
Patent
active
058479597
ABSTRACT:
An electron beam pattern generating system for exposing a pattern on a substrate using a raster scan method. The system stores a rasterized representation of the pattern as a plurality of regular pixel dose exposure levels. These pixel dose exposure levels are evaluated by the system for one or more proximity effects and corrections to the dose exposure level and/or pixel location are calculated. The system includes apparatus for both calculation and storage of intermediate and final results as required. As they are calculated, the corrections are provided to an exposure dose modulator wherein they are applied to forming the pattern. Thus corrections for both long range and short range proximity effects due to both electron scattering and heating as well as for proximity effects due to global thermal expansion can be calculated and provided during run-time and a corrected pattern exposed.
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Babin Sergey
Innes Robert
Trost David
Varner Jeffrey
Veneklasen Lee H.
Berman Bernard
Etec Systems, Inc.
Gordon Paul P.
Klivans Norman R.
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