Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor
Patent
1982-11-01
1985-03-26
Schwartz, Larry I.
Drying and gas or vapor contact with solids
Apparatus
With means to treat gas or vapor
34 68, 118620, 118643, 219 1069, 219 1081, F26B 334
Patent
active
045064520
ABSTRACT:
A method and apparatus for R.F. drying of coated articles, such as gummed envelope flaps wherein the wet gummed flaps are moved through a curvilinear array of electrodes comprising a plate and a grid. The envelopes are carried between two belts around a drum having the plate and grid disposed adjacent to the periphery of the drum. The R.F. current travels diagonally between offset electrodes mounted on the plate and grid. The plate and grid are mounted in a housing which includes an air circulating system to remove heat and moisture from the housing. A screen forms a portion of one wall of the housing through which heat and moisture are exhausted from the housing. The drum is provided with fan blades to remove heat and moisture from within the confines of the drum.
REFERENCES:
patent: 2802085 (1957-08-01), Rothacker
patent: 3866255 (1975-02-01), Serota
patent: 3952421 (1976-04-01), Wilson et al.
patent: 3965851 (1976-06-01), Cohn
patent: 4055295 (1977-10-01), Cohn
patent: 4104804 (1978-08-01), Sargeant
patent: 4236482 (1980-12-01), Gingerich et al.
patent: 4296294 (1981-10-01), Beckert et al.
patent: 4397262 (1983-08-01), Lillibridge et al.
Serota, Rudy, Automation, Sep. 1973, "Heating With Radio Waves."
Champion International Corporation
Jones William W.
Schwartz Larry I.
Sommer Evelyn M.
Westphal David W.
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