Method and apparatus for reuse of abrasive fluid used in the...

Details Method and apparatus for reuse of abrasive fluid used in the... Method and apparatus for reuse of abrasive fluid used in the...

2006-05-30

2006-05-30

Popovics, Robert James (Department: 1724)

Liquid purification or separation

Constituent mixture variation responsive

C210S096200, C210S097000, C210S103000, C210S108000, C210S167050, C210S171000, C210S194000, C210S087000, C210S639000, C210S651000, C210S739000, C210S740000, C210S742000, C210S743000, C241S039000, C241S068000, C241S097000, C241S098000, C241S285100, C451S060000, C451S447000

Reexamination Certificate

active

07052599

ABSTRACT:
An apparatus and method recycles the abrasive fluid or slurry effluent used in the polishing step in the manufacture of semiconductors. Agglomerations of abrasive grains built up in the slurry effluent are crushed using a mill, ultrasonic oscillation, or pressurized circulation. The slurry effluent is then regenerated and reused.

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Japanese Office Action dated May 17, 2005.

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