Method and apparatus for reserving a processing tool in a...

Details Method and apparatus for reserving a processing tool in a... Method and apparatus for reserving a processing tool in a...

2007-10-30

2007-10-30

Bahta, Kidest (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S117000, C700S121000

Reexamination Certificate

active

11338913

ABSTRACT:
The present invention provides a method, an apparatus, and a system for semiconductor manufacturing. The method includes accessing information indicative of operation of at least one first processing tool. The first processing tool is configured to process at least one wafer. The method also includes determining, prior to processing the wafer by the first processing tool, a first reservation indicative of a time period for processing the wafer in at least one of the first processing tools based on the accessed information.

REFERENCES:
patent: 6418350 (2002-07-01), Hamidzadeh et al.
patent: 6785586 (2004-08-01), Toprac et al.
patent: 6957114 (2005-10-01), Logsdon et al.
patent: 2001/0011198 (2001-08-01), Jevtic
patent: 2003/0171972 (2003-09-01), Heskin
patent: 2006/0030966 (2006-02-01), Huang et al.

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