Method and apparatus for repairing defects on a photo-mask patte

Details Method and apparatus for repairing defects on a photo-mask patte Method and apparatus for repairing defects on a photo-mask patte

1985-03-20

1986-09-02

Lusignan, Michael R.

Coating processes

Electrical product produced

Welding electrode

118 501, 118720, 118725, 219121LM, 346 76L, 346108, 427142, 430 5, 430945, B05D 306, C23C 1400, C23C 1600

Patent

active

046095667

ABSTRACT:
A photo-mask is mounted on a repairing chamber, with its mask pattern forming surface being exposed to the interior of the chamber. Vaporized repairing material which includes a metallic element is introduced into the chamber, and a laser beam is projected from the exterior of the chamber onto a transparent defect of the mask pattern. The irradiated portion is heated and the vaporized repairing material at the heated portion is resolved, resulting in the metal resolved from the repairing material deposits and fills the transparent defect. Thus, transparent defects of a mask pattern can be repaired in a simplified process.

REFERENCES:
patent: 4304805 (1981-12-01), Packo et al.
patent: 4444801 (1984-04-01), Hongo et al.
patent: 4463073 (1984-07-01), Miyauchi et al.
patent: 4510222 (1985-04-01), Okunaka et al.
Ehrlich, Daniel J. et al, Laser Microphotochemistry for Use in Solid-State Electronics, Journal of Quantum Electronics, vol. QE-16, No. 11, Nov. 1980.
Singer, Peter H., Photomask and Reticle Repair: Equipment and Techniques, Semiconductor International, pp. 79-86, 88, 90, Sep. 1982.

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