Method and apparatus for removing trace quantities of impurities

Refrigeration – Cryogenic treatment of gas or gas mixture – Separation of gas mixture

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62 502, 62908, 95106, 96126, F25J 100

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057379416

ABSTRACT:
Method and apparatus for removing trace levels of impurities from gases stored cryogenically in a storage vessel in liquid form by passing a vaporized portion of liquified gas from the storage vessel through a bed of adsorbent while using the liquified gas to cool the adsorbent. Vaporized gas resulting from cooling of the adsorbent with the stored liquified gas can be combined with the vapor withdrawn from the storage vessel prior to being passed through the bed of adsorbent. Liquified gas can be withdrawn from the storage vessel, vaporized and the vaporized gas combined with the vaporized gas from the storage vessel prior to being passed through the bed of adsorbent.

REFERENCES:
patent: 4312669 (1982-01-01), Boffito et al.
patent: 4579723 (1986-04-01), Weltmer et al.
patent: 4713224 (1987-12-01), Tamhankar et al.
patent: 4717406 (1988-01-01), Giacobbe
patent: 4839085 (1989-06-01), Sandrock et al.
patent: 4869883 (1989-09-01), Thorogood et al.
patent: 4943304 (1990-07-01), Coe et al.
patent: 5106339 (1992-04-01), Fisher
patent: 5194233 (1993-03-01), Kitahara et al.

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