Gas separation: processes – Liquid contacting – And filtration of gas
Patent
1996-04-29
1997-05-06
Bushey, C. Scott
Gas separation: processes
Liquid contacting
And filtration of gas
552572, 552573, 55259, 55278, 55308, 55322, 55326, 55442, 95268, 95273, 96190, B01D 4500
Patent
active
056266510
ABSTRACT:
A method of removing particulates from a gas stream involves introducing the gas stream in a turbulent flow condition into and through a flow passage situated over spaced surfaces defining a plurality of stagnant, turbulent-free regions of gas in which there is no net gas flow and which communicate with said gas stream and arranging the stagnant regions near the flow passage so that turbulent eddies of said gas stream carrying suspended particulates penetrate spaces between the surfaces and then decay in said stagnant regions defined therebetween where said particulates are trapped and deposited mechanically on said surfaces within each of said regions. The deposits accumulate at bottoms of the regions and can be periodically removed.
REFERENCES:
patent: 672299 (1901-04-01), Thompson
patent: 885185 (1908-04-01), Serrell
patent: 936377 (1909-10-01), Smith et al.
patent: 1434090 (1922-10-01), Christensen
patent: 1562352 (1925-11-01), Lundquist
patent: 1743050 (1930-01-01), Straus
patent: 2448424 (1948-08-01), Dohrmann
patent: 2457292 (1948-12-01), Williams
patent: 3204349 (1965-09-01), Kaufmann et al.
patent: 4113569 (1978-09-01), Mahar
patent: 4247312 (1981-01-01), Thakur et al.
Bushey C. Scott
Dullien Francis A. L.
Institut Francais du Pe'trole
LandOfFree
Method and apparatus for removing suspended fine particles from does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for removing suspended fine particles from , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for removing suspended fine particles from will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2129260