Method and apparatus for removing radiation side lobes

Details Method and apparatus for removing radiation side lobes Method and apparatus for removing radiation side lobes

2004-10-20

2011-11-01

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C716S053000

Reexamination Certificate

active

08048588

ABSTRACT:
A method and structure for removing side lobes is provided by positioning first and second radiation transparent regions of respective first and second phases at a first plane with the first and second phases being substantially out of phase. Further, positioning the first and the second region to cause radiation at a second plane to be neutralized in a first region, not to be neutralized in a second region, and to have a side lobe in a third region. Further, positioning a non-transparent region at the first plane to assure radiation at the second plane to be neutralized in the first region and positioning a third radiation transparent region of the first or second phase at the first plane to neutralize the side lobes in the third region at the second plane.

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“Dark-field high-transmission chromeless lithography”, George E. Bailey, Neal P. Callan, Kunal N. Taravade, John V. Jensen, Benjamin G. Eynon, Patrick M. Martin, Henry H. Kamberian, Darren Taylor, and Rick S. Farnbach, Proc. SPIE 5040, 203 (2003).

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