Method and apparatus for removing particulate material from a wo

Gas separation: processes – Deflecting – And filtering

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34 82, 34480, 55267, 55327, 55337, 55338, 553851, 95283, 95288, B01D 5000

Patent

active

056037511

ABSTRACT:
A gas filtration system which includes a primary separator for removing a majority of a particulate material from a gas stream. The primary separator discharges a filtered gas stream which retains a portion of the particulate material. The filtered gas stream from the primary separator is delivered to a secondary particulate source which introduces additional particulate material into the filtered gas stream to produce a conditioned gas stream containing primary and secondary particulate material. The output of the secondary particulate source is delivered to a secondary filter which removes the primary and secondary particulate material from the conditioned gas stream to output the resulting gas stream, substantially void of particulate material. The conditioned gas stream contains a minimum amount of particulate material necessary to achieve optimal efficiency and operating life within the secondary separator. Optionally, the conditioned gas stream may be further conditioned by heating same to a predefined temperature to avoid condensation of gaseous compounds and liquid vapor, in the gas stream, within the secondary separator. Optionally, a thermal oxidizer may be added to remove VOCs from the resulting gas stream.

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