Chemistry: electrical and wave energy – Processes and products
Patent
1989-05-15
1991-04-16
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
204242, 204264, 204274, 204291, 204292, 501103, 501104, 501126, 437939, 437946, 437949, C25B 102, H01L 2122
Patent
active
050079921
ABSTRACT:
A semiconductor process chamber with electrolytic ceramic cell having one major surface in the chamber. A second major surface of the cell is outside the process chamber. When activated by heat and an electric current between the two major surfaces, the cell selectively removes oxygen from the processing chamber.
REFERENCES:
patent: Re28792 (1976-04-01), Ruka et al.
patent: 3400054 (1968-09-01), Ruka et al.
patent: 3963597 (1976-06-01), Kleitz et al.
patent: 4212891 (1980-07-01), Fujita et al.
patent: 4505790 (1985-03-01), Mase et al.
patent: 4530751 (1985-07-01), Ishiguro
patent: 4547281 (1985-10-01), Wang et al.
patent: 4725346 (1988-02-01), Joshi
patent: 4786395 (1988-11-01), Otsuka et al.
"Coupled Electrocatalysis and Gas Phase Diffusion in a Stabilized-Zirconia Tubular Flow Oxygen Pump". L. M. Rincon-Rubio et al., J. Electrochem. Soc., 132(12), pp. 2919-2928, 1985.
"A Model to Predict the Removal of Oxygen from Air Using a Zirconia Solid Electrolyte Membrane". W. J. Marner et al., Proc. Intersoc. Energy Convers. Eng. Conf., 23rd (vol. 2), pp. 265-271, 1988.
Gorgos Kathryn
Niebling John F.
LandOfFree
Method and apparatus for removing oxygen from a semiconductor pr does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for removing oxygen from a semiconductor pr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for removing oxygen from a semiconductor pr will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-419547