Wells – Processes – Separating material entering well
Patent
1987-07-28
1988-08-30
Massie, IV, Jerome
Wells
Processes
Separating material entering well
166306, 166387, 166106, 166378, 166 664, 166 53, E21B 4338, E21B 4340
Patent
active
047669578
ABSTRACT:
A method and apparatus for effecting the gravitational separation of hydrocarbons and water discharged from a production formation of a subterranean well. The well casing is extended downwardly beyond the production zone to a water absorbing zone of the subterranean well. A mixture of hydrocarbons and water flows into the interior of the casing through perforations disposed adjacent the production zone. A fluid collection chamber is provided either exteriorly or interiorly of the casing perforations permitting the hydrocarbons to rise to the top of any water. The water flows downwardly, or is forcibly pumped downwardly to the water absorbing formation and is absorbed in such formation. If the fluid pressure of the formation is not sufficient to force the hydrocarbons to the surface of the well, any conventional pump may be mounted in the well casing to effect the pumping of the separated hydrocarbons to the well surface.
REFERENCES:
patent: 2214064 (1940-09-01), Niles
patent: 2986215 (1961-05-01), Barr
patent: 3167125 (1965-01-01), Bryan
patent: 3195633 (1965-07-01), Jacob
patent: 3199592 (1965-08-01), Jacob
patent: 3333638 (1967-08-01), Bishop
patent: 3363692 (1968-01-01), Bishop
patent: 4241787 (1980-12-01), Price
patent: 4296810 (1981-10-01), Price
Kisliuk Bruce M.
Massie IV Jerome
Sisson Thomas E.
LandOfFree
Method and apparatus for removing excess water from subterranean does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for removing excess water from subterranean, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for removing excess water from subterranean will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2082560