Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1987-05-04
1989-03-28
Morgenstern, Norman
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427 541, 427 55, 156638, 156643, 156646, 156654, 156657, 156662, B05D 306, B44C 122
Patent
active
048162949
ABSTRACT:
Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate.
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Yokoyama e
Langford Alison A.
Tsuo Simon
Clausen Terry
Midwest Research Institute
Morgenstern Norman
Padgett Marianne L.
Richardson Ken
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