Cleaning and liquid contact with solids – Processes – Work handled in bulk or groups
Patent
1985-04-19
1987-12-08
Metz, Andrew H.
Cleaning and liquid contact with solids
Processes
Work handled in bulk or groups
134 26, 134 30, 134 1, 148DIG17, B08B 302, B08B 3000, B08B 312
Patent
active
047112565
ABSTRACT:
A method for the removal of sub-micron contaminant particles from a surface, such as the surface of a semiconductor wafer. The method comprises washing the contaminated surface in a cleaning solution of a high-molecular-weight highly-fluorinated organic surfactant in a non-ionic highly-fluorinated organic carrier. The surface is then rinsed with a rinsing liquid, which is also a highly-fluorinated organic liquid, and which may be the same as the carrier liquid. In a preferred embodiment, a cascade rinsing method is provided in which the rinsing liquid for each rinsing step is the effluent of the subsequent rinsing step. In a further embodiment, the rinsing liquid has a lower boiling point than the surfactant to permit regeneration of the rinsing liquid by distillation of rinse effluent.
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Particle Contamination and Device Performance, Duffalo et al., Solid State Tech., Mar. 1984, pp. 109-114.
Chemical Technology of Microelectronics, Larrobee, Chem. Tech., Mar. 1985, pp. 168-174.
Metz Andrew H.
Wright William G.
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