Liquid purification or separation – Processes – Including controlling process in response to a sensed condition
Patent
1979-04-12
1980-10-14
Therkorn, Ernest G.
Liquid purification or separation
Processes
Including controlling process in response to a sensed condition
210100, 210104, 210138, 210143, 210168, 210258, 4272552, 118715, 210741, 210744, 210803, 210804, 210806, 210791, B01D 2324
Patent
active
042280044
ABSTRACT:
For a vacuum pump, as used to maintain a partial vacuum in a diffusion furnace for chemical vapor deposition in intermittent runs wherein oil for the vacuum pump becomes contaminated by particulates, an apparatus for removal of particulates from oil for the vacuum pump comprises a settling tank, which is connected to receive oil from the vacuum pump, an oil pump, which is arranged to pump oil from the settling tank, means for filtering particulates from oil pumped from the settling tank, a plurality of oil valves, which are arranged to control flow of oil from the vacuum pump, through the settling tank, through the filtering means, and into the vacuum pump, means for operating the oil pump and opening the oil valves for timed intervals wherein oil flows from the vacuum pump, through the settling tank, through the filtering means, and to the vacuum pump, and means for coordinating the intervals with the runs so that each interval is initiated approximately when a run is terminated.
REFERENCES:
patent: 3900597 (1975-08-01), Chruma
H. Kurokawa et al., "Low Pressure CVD Films Growth Technique and its Equipment," IEEE Denshi Tokyo, 1977, 86-88.
L. I. Maissel et al., Handbook of Thin Film Technology, McGraw-Hill Book Co., N.Y., 1970, 2-4 through 2-17.
Baumeister et al., Marks' Standard Handbook for Mechanical Engineers, McGraw-Hill Book Co., N.Y., 1970, 14-45 through 14-48.
O'Connor, Standard Handbook of Lubrication Engineering, McGraw-Hill Book Co., New York, 1968, 30-1-30-3, 25-34-25-38, 25-39.
W. A. Kohler, "Structural Properties of Vapor Deposited Silicon Nitride," Metallurgical Transactions, vol. 1, Mar. 1970, 735-740.
Ginsburgh et al., "Silicon Nitride Chemical Vapor Deposition in Hot-Wall Diffusion System," Journal of Electrochemical Society, vol. 125, No. 9, Sep. 1978, 1557-1559.
R. S. Rosler, "Low Pressure CVD Production Processes for Poly, Nitride and Oxide," Solid State Technology, Apr. 1977, 63-70.
"Setting Synchronous Motor Driven Automatic Reset General Purpose Timer," Publication In 325, Apr. 1975.
Stokes Division, Pennwalt Corp., "Model 339 Vacuum Pump Oil Purifier," Specification No. 339-1.
Bailey, The Lubrication Engineers Manual, U.S. Steel Corp., 1971, pp. 12-14.
American Timing and Controls Co., Div. American Manufacturing Co., Inc., "Installation and Apparatus Instructions/Series 326, `Tankard` Converter, Digital Setting, Pulse-Motor Driven Automatic Reset General Purpose Count Controller," Publication In 328, Apr. 1975.
American Timing and Controls Co., Div. American Manufacturing Co., Inc., "Installation and Operating Instruction Series 325, `Tankard` Digital Setting Synchronous Motor Driven Automatic Reset General Purpose Timer," _Publication In 325, Apr. 1975.
Stokes Divisional, Pennwalt Corp., "Model 339 Vacuum Pump Oil Purifier," Specification No. 339-1.
Clark George R.
Hoover Allen J.
Rose Neil M.
Therkorn Ernest G.
Thermco Products Corporation
LandOfFree
Method and apparatus for removal of by-products of chemical vapo does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for removal of by-products of chemical vapo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for removal of by-products of chemical vapo will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2099933