Method and apparatus for relieving residual stresses

Metal treatment – Process of modifying or maintaining internal physical... – With vibration

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266 90, C21D 1100

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active

052425126

ABSTRACT:
An apparatus for relieving residual stresses and stabilizing modal behavior in a workpiece, and/or analyzing change in modal behavior of a workpiece to detect buildup of residual stresses. The apparatus includes an exciter for vibrating the workpiece. In addition, the apparatus further includes a computer for varying the frequency at which the workpiece is vibrated in response to the fast fourier transform of the frequency response of the workpiece.

REFERENCES:
patent: 2848775 (1958-08-01), Ettenreich
patent: 3622404 (1971-11-01), Thompson
patent: 3677831 (1972-07-01), Pezaris
patent: 3741820 (1973-06-01), Hebel, Jr. et al.
patent: 3786448 (1974-01-01), Batcher et al.
patent: 4381673 (1983-05-01), Klauba et al.
patent: 4386727 (1983-06-01), Unde
patent: 4446733 (1984-05-01), Okubo
patent: 4718473 (1988-01-01), Musschoot
patent: 4823599 (1989-04-01), Schneider
patent: 4968359 (1990-11-01), Hebel, Jr. et al.
"Industrial Profile: Bonal Technologies, Inc.", Die Cast Management, Oct., 1991.
"The Computation of the Discrete Fourier Transform and some of its Applications", Digital Signal Processing: Theory, Design and Implementation, Robert E. Krieger Publishing Co., Malabar, Florida, Dec. 1985.

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