Etching a substrate: processes – Nongaseous phase etching of substrate – Recycling – regenerating – or rejunevating etchant
Patent
1997-02-05
1999-11-09
Dang, Thi
Etching a substrate: processes
Nongaseous phase etching of substrate
Recycling, regenerating, or rejunevating etchant
216102, B44C 122
Patent
active
059807717
ABSTRACT:
A method and apparatus for economically regenerating chemical etch solutions for aluminum and the alloys thereof without the use of large, complex and expensive processing apparatus. The method of the invention can be accomplished substantially at ambient temperature thereby avoiding the necessity for substantial investment in complex temperature control instrumentation. In accordance with the method of the invention, the spent etchant which is to be regenerated is first mixed with water in a separate storage tank and is then cold filtered prior to being transferred to the reactor or regeneration vessel. This step substantially reduces contamination buildup within the reactor vessel and thereby avoids costly periodic shut down of operations for clean-up. Due to the unique nature of the regeneration process of the invention, the alumina produced as a by product of the process is of extremely high quality and is snow white in color.
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Aerochem, Inc.
Brunton James E.
Dang Thi
Goudreau George
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