Method and apparatus for reducing particulate contamination in p

Material or article handling – Apparatus for moving material between zones having different... – For carrying standarized mechanical interface type

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414786, 414DIG5, 454187, H01L 2168

Patent

active

051453037

ABSTRACT:
A load lock removes particulate contamination during microelectronic manufacturing. The load lock may have a single door or two doors, or a single door and a funnel valve. A passageway is defined through the load lock when the door or doors, or the funnel valve, are opened. The particulate contamination is removed from the load lock by providing a laminar flow of gas through the passageway. The source for generating the laminar flow may be external to the load lock or internal to the load lock.

REFERENCES:
patent: 4632624 (1986-12-01), Mirkovich et al.
patent: 4643627 (1987-02-01), Bednorz et al.
patent: 4676144 (1987-06-01), Smith, III
patent: 4687542 (1987-08-01), Davis et al.
patent: 4727993 (1988-03-01), Mirkovich et al.
patent: 4781511 (1988-11-01), Harada et al.
patent: 4842680 (1989-06-01), Davis et al.
patent: 4851018 (1989-07-01), Lazzari et al.
patent: 4867629 (1989-09-01), Iwasawa et al.
patent: 4904153 (1990-02-01), Iwasawa et al.
patent: 4927438 (1990-05-01), Mears et al.
patent: 4962726 (1990-10-01), Matsushita et al.
patent: 4976815 (1990-12-01), Hiratsuka et al.
patent: 4987673 (1991-01-01), Kogura et al.
patent: 5058491 (1991-10-01), Wiemer et al.

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