Method and apparatus for reducing particulate contamination

Details Method and apparatus for reducing particulate contamination Method and apparatus for reducing particulate contamination

1990-08-28

1993-08-24

Bennett, Henry A.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34 92, 34 22, 156345, F26B 504

Patent

active

052377563

ABSTRACT:
A pressure sealed chamber such as a load lock for a apparatus for processing substrates is provided with a guide plate spaced from a substrate supported therein so as to form a gap which covers the substrate surface to be protected from particulate contamination. During the filling of the chamber and during the evacuation of the chamber, by either pumping or venting, clean gas is introduced through an orifice in the center of the plate so as to flow outwardly from the edge of the gap at a pressure sufficient to deflect or otherwise reduce the number of turbulent gas borne particulates in the chamber from entering the gap and contaminating the surface to be protected of the substrate. During the filling of the chamber, all or some of the gas filling the chamber is introduced through the gap. During the evacuation of the chamber, gas is introduced through the gap at a flow rate less that of the evacuating gas.

REFERENCES:
patent: 4532970 (1985-08-01), Tullis et al.
patent: 4544446 (1985-10-01), Cady
patent: 4718975 (1988-01-01), Bowling et al.
patent: 4816081 (1989-03-01), Mehta et al.
patent: 4857132 (1989-08-01), Fisher
patent: 4936940 (1990-06-01), Kawasumi et al.
patent: 4943457 (1990-07-01), Davis et al.
patent: 4966669 (1990-10-01), Sadamori et al.
Balder and Cachon, I.B.M. Technical Disclosure, Diverter Flow Bernoulli Pick Up Device Oct. 1979.

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